飞秒激光制备CdS薄膜滤波器的研究  

Fabrication of CdS Thin Film Filter Using Femtosecond Pulsed Laser Deposition

作　　者：童杏林[1] 刘恋[1] 姜德生[1] 刘忠明[1] 

机构地区：[1]武汉理工大学光纤传感技术与信息处理教育部重点实验室,武汉430070

出　　处：《Journal of Semiconductors》2007年第5期717-721,共5页半导体学报（英文版）

基　　金：中国博士后科学基金(批准号:2005037666);国家自然科学基金(批准号:60537050)资助项目~~

摘　　要：采用脉冲飞秒激光沉积方法,在石英衬底上制备了CdS薄膜滤波器.研究显示衬底温度在100～600℃范围内变化对CdS薄膜衬底的结构及光学特性有重要影响,在450℃的衬底温度下所生长的CdS薄膜具有较好的结构质量,该薄膜在500nm附近具有较陡的吸收带边及良好的光学滤波性能.A CdS thin film filter is grown on quartz substrate using femtosecond pulsed laser deposition. The influence of the substrate temperature on the structural and optical characteristics of CdS thin films is systematically studied in the range of 100-600℃. The results show that the structural quality is excellent for the CdS thin film that was fabricated at the substrate temperature of 450℃. Optical transmission shows that the CdS thin films possess a steep absorption edge,resulting in a sharp transition between absorbed and transmitted wavelengths, which can be used as an optical filter.

关 键 词：CdS薄膜滤波器 脉冲激光沉积 结构和光学特性 

分 类 号：O484.1[理学—固体物理]