喷嘴-平板直流电晕放电中的OH(A^2Σ^+→X^2Π,0-0)光谱研究  

OH(A^2Σ^+→X^2Π,0-0) emission spectrum in nozzle-to-plate DC corona discharge

作　　者：高翔[1] 余权[1] 吴祖良[2] 谭永杰[1] 沈旭[1] 骆仲泱 岑可法[1] 

机构地区：[1]浙江大学能源清洁利用国家重点实验室,杭州310027 [2]浙江工商大学环境工程系,杭州310035

出　　处：《强激光与粒子束》2007年第4期700-704,共5页High Power Laser and Particle Beams

基　　金：国家863计划项目资助课题(2002AA529180);国家973计划项目资助课题(2006CB200303)

摘　　要：为更深入地认识电晕放电低温等离子体中自由基的生成机理,以发射光谱测量为基础并结合背景气体淬灭率影响,研究了常压下喷嘴-平板电晕自由基簇射过程中放电参数、背景气体、电极气成分等因素对OH(A2Σ+→X2Π,0-0)发光的影响。结果表明:在放电参数影响中,放电电压及放电电流都会影响OH生成量,OH发光随功率增加而大大增强;在加湿氮气直流电晕放电中有明显的OH(A2Σ+→X2Π,0-0)光谱存在,但加湿空气条件下OH生成较少;载气增湿后OH生成量明显增多,而Ar和O2的存在分别增强和减弱了OH(A2Σ+→X2Π,0-0)发光,可能的原因是这两种物质影响了放电和OH(A2Σ+)的淬灭。In order to get extensive knowledge of radical production in a corona induced non-thermal plasma, the effect of discharge parameter, gas condition on emission intensity of OH （A^2Σ^＋→X^2Π,0-0） in a nozzle-to-plate corona radical shower system are experimentally investigated using emission spectroscopy considering the collisional quenching rate. The results are that： both discharge voltage and current have direct influence on OH emission, OH production increases as discharge power rises; remarkable emission spectrum of OH （A^2Σ^＋→X^2Π,0-0） is detected in N2 DC corona discharge, but few OH radicals exist in air discharge; humidification of electrode gas can enhance the OH emission, and the existence of Ar increases the OH emission, while 02 may reduce the OH emission, the possible reason is that discharge characteristic and collisional quenching rate of OH（A^2Σ^＋） are changed by these factors.

关 键 词：OH自由基 发射光谱 电晕 自由基 放电 淬灭 

分 类 号：O561[理学—原子与分子物理] X122[理学—物理]