低压甲烷等离子体发射光谱诊断  

Diagnosis of Low-Pressure Methane Plasma by Optical Emission Spectroscopy

作　　者：罗利霞[1] 吴卫东[2] 孙卫国[1] 唐永建[2] 朱永红[1] 

机构地区：[1]四川大学原子与分子物理研究所,成都610065 [2]中国工程物理研究院激光聚变研究中心,绵阳621900

出　　处：《真空科学与技术学报》2007年第3期203-207,共5页Chinese Journal of Vacuum Science and Technology

基　　金：中国工程物理研究院重大基金(No.2052)

摘　　要：在CH4/He体系下,利用光学发射谱技术,对螺旋波放电产生低压甲烷等离子体内活性粒子的光学发射特征进行了原位测量。根据甲烷离解后产生的所有可能基、团的对称性、构造并分析了甲烷离解的所有可能反应通道,进一步证实了CH、Hα、Hβ以及Hγ等碎片粒子的存在。研究了各实验参量对活性基团CH、Hα、Hβ以及Hγ的发射谱强度的影响。结果表明:CH粒子发射光谱谱线相对强度随着射频功率的增大是先增大而后减小,随工作气压的增大而逐渐减小;随气压及功率的增加,Hα、Hβ以及Hγ相对强度变化的总体趋势都是先增加而后减小的。该结果为等离子体沉积各种薄膜过程的理解及制备工艺参数的调整提供了基础数据。A novel technique has been developed to in-situ diagnose the low pressure methane plasma generated by spiral wave discharge with optical emission spectroscopy（OES）. Emission intensities of the active particles, including CH,Hα, Hβ, and Hγ were evaluated and the possible decomposition mechanisms of methane were discussed. The results show that the RF power and pressure strongly affect the emission intensity of all active particles. For instance, as RF power increases, the relative emission intensity of CH first increases, but then decreases; and it decreases with the increase of pressure. Generally speaking, as the RF power and the pressure increase, the relative emission intensities of Hα, Hβ, and Hγ increase at first and then decrease.

关 键 词：光学发射谱 甲烷等离子体 螺旋波放电 

分 类 号：O53[理学—等离子体物理]