非晶金刚石薄膜对温度的敏感性研究  

Temperature-dependence of Microstructural Properties of Amorphous Diamond Films

作　　者：朱嘉琦[1] 孟松鹤[1] 陈旺寿[1] 韩杰才[1] 

机构地区：[1]哈尔滨工业大学 复合材料与结构研究所,哈尔滨150080

出　　处：《无机材料学报》2007年第3期565-569,共5页Journal of Inorganic Materials

基　　金：国家"十五"预研计划项目(41312040401);国家863计划项目(2002AA305507);国家自然科学基金(50602012);哈尔滨工业大学优秀青年教师培养计划(HITQNJS.2006.026)

摘　　要：采用过滤阴极真空电弧技术制备非晶金刚石薄膜,在-190-600℃范围研究非晶金刚石薄膜的温度敏感性．利用液氮泵在Linkam试验台上冷却样品并实时采样,通过炉中退火实现样品加热．分别测试可见光拉曼光谱和纳米压痕,研究薄膜的微结构和机械性能的变化．实验表明:过滤阴极真空电弧制备的非晶金刚石薄膜具有较好的热稳定性．在空气中退火到400℃,其硬度和弹性模量基本保持不变,其结构可以一直稳定到500℃,但是到600℃,薄膜因为氧化作用而快速消耗．非晶金刚石薄膜的可见光拉曼光谱显示随着温度的升高,谱峰峰位向高频偏移．在低温冷却过程中,薄膜对温度变化不敏感,其结构保持不变．The temperature sensibility of amorphous diamond （a-D） films deposited with the filtered cathodic vacuum arc technology was investigated in the range of-190-600℃. The samples cooled by liquid nitrogen pump were in situ measured on a Linkam stage and the samples for thermal stability were heated in a furnace. The microstructure and mechanical properties were respectively examined by visible Raman spectroscopy and a nanoindenter. The results show that a-D films have better thermal stability in air, they can hold their hardness up to 400℃ and hold their structure up to 500℃. However, the complete material loss takes place at about 600℃. Raman measurements show an apparent shift of the G-peak frequency to higher values with increasing annealing temperatures. The films are not sensitive to lower temperatures. The microstucture of the films remains stable as temperatures are decreased to -190℃.

关 键 词：非晶金刚石 过滤阴极真空电弧 温度敏感性 拉曼光谱 

分 类 号：O484[理学—固体物理]