压印溶胶-凝胶材料制备阵列微结构  

Sol-gel Arrayed Micro-structures Prepared by Imprinted Lithography

作　　者：徐键[1] 王公平[1] 董建峰[1] 徐清波[1] 

机构地区：[1]宁波大学信息科学与工程学院,宁波315211

出　　处：《武汉理工大学学报》2007年第E01期278-280,共3页Journal of Wuhan University of Technology

基　　金：国家科技部国际科技合作重点项目（2006DFA52910）,浙江省科技厅项目（2006R10038）和教育部留学回国人员科研基金.

摘　　要：表面微结构的制备是微光子器件制备过程中一个十分重要的步骤。为了降低工艺复杂性和成本，把软刻技术与溶胶一凝胶材料相结合应用于微光子器件中光路微结构图案的制备。采用软刻工艺，即通过表面带微结构图案的弹性模板压印在玻璃或硅片上溶胶-凝胶来实现微结构图形的转移，研究重复使用PDMS模板来压印出微结构图案。用高倍光学显微镜和扫描电子显微镜（SEM）观察所制备的溶胶-凝胶材料的表面微结构，分析影响压印结果的因素，获得了畸变小的表面微结构，如线阵结构（1维光栅）和点阵结构（2维光栅结构）图案。Preparation of micro-/nano-structured surface is a very important processing for obtaining micro-photonic devices. Due to low-cost, simple process and low requirement of the operating environment, imprint lithography, as one of the softlithography, combined with the sol-gel technique was used to prepare micro-structured surfaces on glass slides or silicon wafers. A PDMS elastic stamp with surface-pattemed relief micro-structures was used to transfer the relief patterns to the surfaces of various sol-gel materials on the substrates. After heat-treatments, the PDMS stamp was peeled off from the sol-gel materials to obtain the surface micro-structures on the substrates. Finally, the surface micro-structures prepared in the experiments were observed by optical microscopy with a high-resolution CCD eamera. The factors affecting the result were discussed.

关 键 词：表面微结构 溶胶-凝胶 软刻工艺 

分 类 号：TB383[一般工业技术—材料科学与工程] O484[理学—固体物理]