F离子掺杂TiO_2的性能研究  

Study on the Performance of F-Doped TiO_2

作　　者：江宏富[1] 周作兴[1] 刘杏芹[1] 孟广耀[1] 

机构地区：[1]中国科学技术大学材料科学与工程系,安徽合肥230026

出　　处：《感光科学与光化学》2007年第3期223-229,共7页Photographic Science and Photochemistry

基　　金：国家973规划项目(2003CB615700)

摘　　要：以NH4F为掺杂剂,采用溶胶-凝胶法制备F离子掺杂型TiO2光催化剂,对其进行XRD、XPS和PL表征,结果表明,F离子掺杂TiO2由于Ti-F配位体的形成而能抑制金红石相的生成,同时F离子掺杂能增加TiO2表面缺陷浓度并降低Ti2P键的结合能,另外,由于F离子能取代Ti-OH配位体而降低了表面羟基氧浓度.光催化研究结果表明,F离子掺杂提高了TiO2光催化活性近1.5倍.F-doped TiO2 photocatalyst was prepared by sol-gel method with NH4F as dopant. The catalyst was characterized by XRD, XPS, and PL. It was found that the phase formation of mtile was suppressed by F-doping due to the formation of Ti-F ligand. Moreover, the surface defect of TiO2 was increased while the binding energy of Ti2p was decreased by F-doping. It was also found that the surface OOH concentration was decreased by F-doping due to the F ions replacing Ti-OH bond. The results of photocatalytic reaction indicated that the photocatalytic activity of F-doped TiO2 was 1.5 times higher than that of undoped TiO2.

关 键 词：TIO2 光催化 F离子掺杂 NH4F 

分 类 号：O614.411[理学—无机化学] O643.36[理学—化学]