一种干涉测温的新方法  

A Novel Interferometric Thermometry

作　　者：鲁强[1] 曾绍群[1] 徐海峰[1] 刘贤德[1] 

机构地区：[1]华中理工大学光电子工程系

出　　处：《光电工程》1997年第1期46-50,共5页Opto-Electronic Engineering

基　　金：国防科工委科技预研基金

摘　　要：针对前后表面平行抛光的物质（如半导体芯片等），干涉测温是一种非常有效的非侵入性测量方法。本文中对常规干涉测温法进行改进，提出了一种新方法——弱相干法。该方法利用光源的弱相干性抑制背景反射光，选择所需信号光进行干涉测量，从而提高测量精度。The interferometric thermometry is an effective non invasive technique for measuring the temperature of substrate with parallel polished front and back surfaces(such as semiconductor wafer etc.).This paper introduces a novel method—low coherence thermometry(LT).It can improve the conventional interferometric thermometry.It uses the low coherence of the optical source to restrain the reflecting light in the background and the interferometry can be carried out by choosing the needed signal light,thus the measuring accuracy can be improved.The basic principle and the corresponding experiments of the low coherence method are described in the paper.

关 键 词：温度测量 干涉术 弱相干 无损检测 

分 类 号：TH811[机械工程—仪器科学与技术]