微晶FeTaN薄膜的结构及磁性研究  

Study on the Structure and Magnetic Properties of Microcrystalline FeTaN Thin Films

作　　者：肖春涛[1] 耿胜利[1] 刘建中 杨正 

机构地区：[1]兰州大学物理系,兰州730000

出　　处：《磁性材料及器件》1997年第1期8-11,共4页Journal of Magnetic Materials and Devices

摘　　要：用射频溅射法在Ar＋N2混和气氛中制备了Fe90Ta10－N膜，发现Ta的添加改善了磁性能的热稳定性，而且对Fe4N相的生成有明显的抑制作用。另一方面，Ta的加入在Fe晶格中造成了较大的晶格膨胀，使α－Fe（110）面内的总各向异性能变得很大，以致于不能获得很低的矫顽力。Fe90 Ta10-N films were prepared by using rf sputtering method in Ar+N2 mixed atmosphere. It was found that the addition of Ta improved the heat stability of magnetic properties and inhibited the formation of Fe4N phase. On the other hand,the addition of Ta resulted in a large expansion of Fe lattice, and the total anisotropy energy in(110) p1ane of α-Fe bacame so high that very low coercive force could not be obtained.

关 键 词：微晶膜 结构 磁性能 磁记录技术 软磁材料 

分 类 号：TM271.2[一般工业技术—材料科学与工程] TQ581[电气工程—电工理论与新技术]