平行电极表面磁场对电沉积钴-镍镀层的影响  

Effect of Magnetic Field Parallel to Cathodic Surface on Electro-Plating Co-Ni Alloy

作　　者：王森林[1] 洪亮亮[1] 

机构地区：[1]华侨大学材料科学与工程学院应用化学系,福建泉州362021

出　　处：《稀有金属》2007年第2期211-215,共5页Chinese Journal of Rare Metals

基　　金：福建省自然科学基金资助课题(E0210020)

摘　　要：在硫酸盐体系中电沉积钴-镍合金,采用X射线能谱分析和扫描电镜研究pH值、阴极电流密度以及外加平行于阴极表面磁场对镀层组成、表面形貌的影响。发现增大电流密度或者pH,钴-镍合金的沉积速率增大、所得镀层中的钴含量减少,镀层表面的晶粒粒径增大。外加平行于电极表面的磁场可以略微提高沉积速率和电流效率以及使所得镀层表面均匀,晶粒细小。采用X射线衍射研究在镀液pH 3.0下阴极电流密度和外加磁场对所得镀层结构的影响。结果表明,电沉积钴-镍合金镀层呈六方密堆积(hcp)的(100)和(110)晶面择优取向;外加平行于电极表面的磁场可以促进(110)晶面择优生长和抑制(002)晶面择优生长。Electro-deposition of Co-Ni alloys was performed in a sulphate solution. The effect of the plating conditions, such as the cathodic current density, the bath pH and the magnetic field parallel to the cathodic surface on the composition and the surface morphology of the Ni-Co coating were investigated by SEM and EDS. With the increase of the current density or the bath pH, the plating rate increased, but the content of Co in the deposit decreased, and the diameter of grain increased. The magnetic field parallel to the cathodic surface could improve the plating rate, and made the diameter of grain of the deposit decrease. The influ- ence of the cathodic current density at bath pH 3.0 and the magnetic field parallel to the cathodic surface on the structure of the deposit was studied by X-ray diffraction, respectively. As a result, the deposit consisted of hexagonal phase with a strong preferred orientation of （100） and （110） planes, the magnetic field could promote to form the （110） plane, but restrained the （002） plane.

关 键 词：钴-镍合金 电沉积 磁场 

分 类 号：O646[理学—物理化学]