甲基丙烯酰氧基三甲氧基硅烷改性SiO_2的制备  

Preparation of mono-disperse γ-methacryloxypropyltrimethoxysilane (MPS) modified silica nanoparticles by an in situ one-step process

作　　者：姜立忠[1] 战佳宇[1] 武德珍[1] 金日光[1] 

机构地区：[1]北京化工大学新型高分子材料制备与加工北京市重点实验室,北京100029

出　　处：《北京化工大学学报（自然科学版）》2007年第3期287-289,共3页Journal of Beijing University of Chemical Technology(Natural Science Edition)

基　　金：国家自然科学基金(50573007);高等学校博士学科点专项基金(200600100006)

摘　　要：采用原位一步法制备了表面甲基丙烯酰氧基三甲氧基硅烷(MPS)改性的单分散纳米二氧化硅(SiO2)粒子。该过程将纳米SiO2的缩合形成过程与功能化改性同步进行,并用红外光谱(FTIR)、X射线光电子能谱(XPS)、透射电子显微镜(TEM)、热失重分析(TGA)等测试方法研究了粒子的表面化学结构、形态和分散性以及粒子中MPS的含量。结果表明,原位一步法制备的MPS改性纳米SiO2粒子粒径约75 nm,基本上呈单分散状态,且含有大量的MPS功能性基团,其表面密度为3.45μmol/m2。Mono-disperse γ-Methacryloxypropyltrimethoxysilane （MPS） modified silica nanoparticles have been prepared by an in situ one-step process in which the preparation and modification steps were carried out concurrently. FTIR, XPS, TGA and TEM were used to characterize the chemical structure and morphology of the silica nanoparticles. The results indicated that the nanoparticles were mono-disperse with an MPS organic shell having an external diameter of 75 nm and a surface density of about 3.45μmol/m^2.

关 键 词：原位一步法 甲基丙烯酰氧基三甲氧基硅烷(MPS) 单分散 纳米二氧化硅 

分 类 号：TQ127.2[化学工程—无机化工]