现代离子注入机的机械扫描技术  

Mechanical Scanning Technology of Ion Implanter

作　　者：吴尚德[1] 

机构地区：[1]湘潭大学机械工程学院,湖南湘潭411105

出　　处：《现代机械》2007年第3期69-71,共3页Modern Machinery

摘　　要：简单介绍了典型离子注入机的组成,分析了离子注入机中扫描技术的重要性。随着集成电路工艺技术的提高,对离子注入提出更高的要求,传统的批注入已不能满足当前的工艺,从而开发出了适应当前工艺的单晶片注入的机械扫描技术。这种注入技术解决了技术上的难题,也很好地控制了成本风险,同时具有更高精度、更少污染等一系列优点,成为当前高端离子注入机机械扫描技术的首选。本文对国内外技术进行了对比,对国内离子注入机机械扫描技术的发展进行了展望。Introduced the configuration of typical ion implanter, analyzed the importance of the implantation mechanical scanning technology. Along with the development of integrated circuit, the traditional batch implantation has already can＇t satisfy a current process, the single wafer implantation with the mechanical scanning solved the technique problem, also controlling the cost risk , having a series of advantage of higher accuracy, less contamination etc, becoming the current high level ion implanter the best choice. Contrast to the domestic and international technique in addition, and provide a outlook for the domestic ion implanter mechanical scanning tech-nology.

关 键 词：离子注入机 机械扫描 批注入 单晶片注入 平行离子柬 

分 类 号：TN305.3[电子电信—物理电子学]