复合电沉积制备石英管薄膜电阻的研究  被引量:1

Research on the preparation of quartz tude resistive films by composite electrodeposition

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作  者:何捍卫[1] 黄冠[1] 魏盈盈[1] 李瑞迪[1] 

机构地区:[1]中南大学粉末冶金国家重点实验室,湖南长沙410083

出  处:《功能材料》2007年第6期947-951,共5页Journal of Functional Materials

基  金:国家高技术研究发展计划(863计划)资助项目(2003AA305980)

摘  要:为了能在石英玻璃管上获得一层具有一定电阻值的薄膜用以制备离子加速器,采用复合电沉积的方法进行,以化学镀Ni-P合金的石英玻璃管为基体,以硫酸镍为主盐的电镀液中加入二氧化硅纳米级微粒,通过复合电沉积的方法获取了在基体表面呈弥散分布的Ni-P-SiO2复合镀层,讨论了各参数(阴极电流密度,镀液成分等)与电阻之间的关系,用扫描电镜(SEM)、X射线衍射(XRD)、能谱(EDX)等手段对涂层表面形貌、微观结构进行检测,并且使用万用电表和SDHC型数字点式测量仪对表面电阻率进行了分析测量,实验结果表明,通过复合电沉积的方法可以使得不导电的石英玻璃管表面形成具备一定电阻值的电阻薄膜,并且电阻率大小与镀层中二氧化硅含量的成正比关系。随着二氧化硅含量的增加,电阻率可达到6.017×103μΩ.cm。In order to obtain definite resistance thin films on quartz-glass for ionic accelerator ,the resistive films were prepared by composite electrodeposition in the paper. As the bulk material-quartz-glass tude by electroless Ni-P alloy plating, adding SiO2 (nanometer)into the plating solution which main salt is NiSO4 ,it can be obtained Ni-P-SiO2 composite coating of bulk material surface by composite electrodeposition. The main processing parameters (current density and content of solution) were investigated,and the surface morphology and microstructure was observed by SEM,XRD,EDX and surface resistivity was tested by avometer and SDHC digital. The results show that the nonconducting quartz-glass tude surface can have definite resistance by composite electrodeposition,and there were derict relation between resistivity and the content of SiO2. The resistivity can reach to 6. 017 × 10^3μΩ· cm as the addition of SiO2 (%) in the coating.

关 键 词:离子加速器 石英管 电阻率 复合电沉积 

分 类 号:TQ153[化学工程—电化学工业]

 

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