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作 者:陈玉红[1] 唐致远[1] 童汝亭[2] 王庆飞[2]
机构地区:[1]天津大学化工学院应用化学系,天津300072 [2]河北师范大学化学与材料科学学院,石家庄050016
出 处:《中国腐蚀与防护学报》2007年第3期156-161,共6页Journal of Chinese Society For Corrosion and Protection
基 金:国家自然科学基金资助项目(29973026)
摘 要:用自组装技术使席夫碱在Cu表面自组装成膜,用扫描电子显微镜(SEM)、交流阻抗方法及量子化学法研究了席夫碱结构对Cu缓蚀作用的影响.结果表明:席夫碱类化合物在发挥其活性时应以接受电子为主,此类化合物的亚胺或甲亚胺特性基团(-RC=N-)和苯环上的-OH是该类化合物的主要活性区,席夫碱苯环的-H被给电子基团取代会提高对Cu的缓蚀效率,且取代基团越靠进-C=N-,形成的螯合物越稳定,缓蚀效率越高.Self-assemble monolayers of different Schiff bases were formed on copper surface by self - assemble technology. The effects of corrosion inhibition efficiency on Schiff base structure were studied by electrochemistry impedance spectrum(EIS), scanning electron microscopy (SEM) and quantum chemical calculation. The results showed that the Schiff bases mainly accepted electrons while reacting and the nitrogen atom in the - C = N - groups and the oxygen atom in - OH groups were the mainly reaction groups. If the hydrogen atoms at aromatic rings of Schiff bases were substituted by abundant electron groups,the corrosion inhibition efficiency were improved and the closer the abundant electron groups to - C = N - groups,the higher the corrosion inhibition efficiency.
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