高反射薄膜在DF激光辐照下的温度场分布  

Temperature Distribution of Thin Film Coatings with High Reflectivity Irradiated by DF Laser

作　　者：江腾蛟[1] 

机构地区：[1]嘉应学院物理系,广东梅州514015

出　　处：《应用激光》2007年第3期234-236,240,共4页Applied Laser

摘　　要：建立了光学薄膜温度场的基本理论,利用交替隐型技术,对3.8μm DF激光辐照下高反射薄膜的温度场分布进行了数值模拟和理论分析。The basic theory of the temperature field of optical thin films is built. The temperature field distribution of thin films with high reflectivity irradiated by 3.8 （m DF laser have been simulated numerically and analyzed theoretically by using alternating direction-implicit technique.

关 键 词：DF激光 光学薄膜 温度场 热吸收 

分 类 号：TN241[电子电信—物理电子学]