具有高斯横向分布的环形染料腔中带模型下的光学双稳性  

OPTICAL BISTABILITY BASED ON THE BAND MODEL IN A DYE RING CAVITY WITH GAUSSIAN TRANSVERSE PROFILE

作　　者：田淑芬[1] 樊锡君[2] 

机构地区：[1]山东师范大学传播学院 [2]亚利桑那州立大学化学系和固态科学中心

出　　处：《红外与毫米波学报》1997年第3期199-205,共7页Journal of Infrared and Millimeter Waves

摘　　要：利用带模型理论研究了环形腔染料激光器中的光学双稳性，使用了真实的高斯横模腔场分布．并将所得到的结果分别与使用平面波近似下的带模型结果以及单横模近似下的二能级模型结果进行了比较．The optical bistability in a dye ring cavity laser was investigated by using the theory of band model. In the study, the real distribution of the cavity field with Gaussian transverse profile was used. The result was compared with those which were obtained by using plane wave approximation based on the band model and the two level model in one transverse mode approximation, respectively.

关 键 词：染料激光器 环形腔 带模型 光学双稳 激光 

分 类 号：TN241[电子电信—物理电子学]