一种新型的半导体光催化剂——纳米氧化亚铜  

A Novel Semiconductor Photocatalyst——Nano Cuprous Oxide

作　　者：魏明真[1] 霍建振[1] 伦宁[2] 马西骋[3] 温树林[2] 

机构地区：[1]临沂师范学院物理系,临沂276005 [2]山东大学材料科学与工程学院,济南250061 [3]山东大学化学与化工学院,济南250061

出　　处：《材料导报》2007年第6期130-133,共4页Materials Reports

摘　　要：半导体光催化技术是解决环境污染问题的有效手段,从光催化的催化机理出发,在分析了二氧化钛光催化剂的局限性的基础上,介绍了一种新型的可见光型半导体光催化剂——纳米氧化亚铜,对其制备方法和在光催化剂方面的研究进展作了综述,并对光催化剂的应用及未来研究方向进行了展望。Semiconductor photocatalytic technology is an effective method to proceed with pollutions. First catalytic mechanism of photocatalyst is given and then nano cuprous oxide is introduced as a novel visible light responding semiconductor photocatalyst after analyzing the defects of titanium dioxide photocatalyst that is used. The preparation methods and research progresses of nano cuprous oxide are summarized. And the applications of photocatalysts and research aspects in future are presented.

关 键 词：半导体光催化剂 催化机理 纳米氧化亚铜 

分 类 号：X52[环境科学与工程—环境工程]