厚膜介质用CaO-Al_2O_3-SiO_2微晶玻璃的研究  

Study on CaO-Al_2O_3-SiO_2 Ceramic-Glass Used for Thick-Film Dielectric

作　　者：张为军[1] 堵永国[1] 胡君遂[1] 

机构地区：[1]国防科技大学航天与材料工程学院,长沙410073

出　　处：《硅酸盐通报》2007年第3期422-426,471,共6页Bulletin of the Chinese Ceramic Society

摘　　要：以CaO-Al_2O_3-SiO_2(CAS)系微晶玻璃作为厚膜介质,研究CAS系微晶玻璃中形核剂的选择,以及形核剂对CAS玻璃的软化温度与析晶温度的影响规律,使其烧成温度与析晶温度满足厚膜电路850℃标准烧成工艺的要求;并简单分析形核剂的作用机理。The CaO-A12O3-SiO2 ceramic-glass was used for thick-film dielectric. The nucleating agents were selected and the softening and crystallization temperature of CaO-A1203-SiO2 ceramic-glass were t studied. By studying, the softening and crystallization temperature must be contented to the 850~C firing temperature of thick-film circuit. At last, the operation mechanism of nucleating agents was studied.

关 键 词：厚膜介质 微晶玻璃 形核剂 

分 类 号：TQ171[化学工程—玻璃工业]