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出 处:《强激光与粒子束》2007年第6期951-955,共5页High Power Laser and Particle Beams
基 金:国家863计划项目资助课题
摘 要:根据8 mm回旋速调管放大器对双阳极磁控注入电子枪的要求,分析了电极形状、阳极电压、磁场、注电流对电子注横纵速度比和速度零散的影响,并进行了粒子模拟。分析表明:这些因素可归根为电场和磁场的作用,阴极附近高的电场有助于提高横纵速度比和降低速度零散;而高的磁场及低的磁压缩比将降低横纵速度比,但对速度零散影响无明显规律。在此基础上通过优化电极形状、磁场分布、电流、第一阳极电压和第二阳极电压,模拟并试制出工作电压65 kV、电流12 A、磁场1.4 T的双阳极电子枪,得到的横纵速度比值为1.4,横向速度零散为4.5%,为8 mm回旋速调管提供了稳定高质量的电子注。According to demand of the double anode magnetron injection gun for gyroklystron amplifier, many factors influencing electron gun performance, such as electrode shape, magnetic distribution, beam current, first anode voltage, second anode voltage, were discussed, The results show that the transverse to longitudinal velocity ratio of beam increases and the trans-velocity spread decreases when the first anode voltage increases or magnetic induction at the cathode decreases, when the first anode obliquity reduces and cathode obliquity increases, the transverse to longitudinal velocity ratio of beam increases and the transvelocity spread will decrease. Quality of electron beam is improved by adjusting the distance between the cathode and the first anode and the first anode voltage properly. An electron gun with the transverse to longitudinal velocity ratio of beam 1.4 and the trans-velocity spread 4.5% was abtained by a great deal of simulation using Egun program when the working voltage was 65 kV and the working electric current was 12 A.
关 键 词:高功率微波 回旋速调管放大器 磁控注入电子枪 横纵速度比 速度零散
分 类 号:TN722[电子电信—电路与系统]
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