纳米二氧化硅的制备  

Preparation of Nanometer Silica

作　　者：郭英凯[1] 赵燕禹[1] 赵国华[1] 查立祥[1] 商连弟[2] 

机构地区：[1]天津职业大学,天津300402 [2]天津化工研究设计院,天津300131

出　　处：《盐业与化工》2007年第4期29-31,共3页Jounral of Salt and Chemical Industry

摘　　要：叙述了纳米二氧化硅的制备研究。试验以无机盐——氯化钠为反应介质,使用不同浓度的硅酸钠和硫酸分别在pH=9,pH=6,和pH=3条件下进行反应,生成水合二氧化硅,经过滤、洗涤,干燥制得纳米二氧化硅。制备的纳米二氧化硅样品进行了堆积密度、比表面积、孔容积和粒度以及TEM的测定。从几种测定的结果可以看出,本试验方法制备的纳米二氧化硅粒径在9nm～37nm之间。最佳条件制备的纳米二氧化硅粒径在10nm左右。This paper is concerned with preparation of nanometer silica. In the medium of inorganic salt and sodium chloride, sodium silicate reacted with different concentrations of sulfuric acid when pH was nine, six and three respectively to produce hydrated silia. Through washing filtering and drying processes, the nanometer silica was obtained. Then the samples obtained were determined by bulk density, specific surface area, pore volume, particle size and TEM. Results showed that the particle diameters of the prepared nanometer silica were between 9nm and 37nm. In the optimum condition,the nanometer silica had a diameter of around 10nm.

关 键 词：纳米 二氧化硅 制备 

分 类 号：TQ127.2[化学工程—无机化工]