一种测量纳米薄膜厚度的新方法  

Method of Measuring the Thickness of Nano-scale Thin Film

作　　者：喻江涛[1] 李明伟[1] 王晓丁[1] 程旻[1] 

机构地区：[1]重庆大学动力工程学院,重庆400030

出　　处：《重庆大学学报（自然科学版）》2007年第6期35-38,共4页Journal of Chongqing University

基　　金：国家自然科学基金资助项目(5067113);教育部新世纪优秀人才支持计划(NCET-05-0761)

摘　　要：提出了一种量测纳米薄膜厚度的方法,即根据纳米薄膜与其基底间存在的力学性质上的差异,选用合适的刻划工具,通过对薄膜直接进行刻划,产生划透薄膜且不影响基底的划痕,再运用原子力显微镜扫描,得到划痕区域的微观形貌,由此计算出纳米薄膜的厚度。用该方法对TiO2纳米薄膜进行测量,得到薄膜的平均厚度为71.6 nm,与相关文献报道的用其它方法测得的薄膜厚度值较吻合。作为测量纳米薄膜厚度的又一方法,此法具有适用范围广,厚度图像直观,操作和计算均较为简单,精度较高的特点。A method is proposed to measure the thickness of nano-scale thin film. Based on the differences about mechanical property between the film and the base, a required scratching will be obtained with the proper tool scratching the film directly, which is through the film touching the base and without any effects to the surface of the base. Scanning the scratching area by using atomic force microscope, some data will be obtained and the average thickness of nano-scale thin film can be calculated in the scratching area. The thickness of the TiO2 nano-scale thin film was measured by this method, the experiment result showed that the average thickness of the film is 71.6 nm, which is consistent with the reported result of the reference. This method has high measuring precision, wider application area, more intuitive images, simpler calculation and operation.

关 键 词：纳米薄膜厚度 原子力显微镜 划痕处理 测量 

分 类 号：O484.5[理学—固体物理]