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作 者:王衍[1] 侯建国[1] 吴自勤[1] 朱晓光[2] 巴龙[2]
机构地区:[1]中国科技大学基础物理中心 [2]中国科学院固体物理所
出 处:《电子显微学报》1997年第3期261-264,共4页Journal of Chinese Electron Microscopy Society
基 金:国家自然科学基金
摘 要:本文采用真空交替蒸发的方法,在NaCl室温和160℃衬底上制备了Ag/C60薄膜。用透射电镜研究了薄膜的形貌和结构,结果表明:室温下生长的薄膜表面较平坦,C60为非晶;160℃下生长的薄膜由于C60和Ag的界面间互扩散而导致表面粗糙度增加,并依赖于Ag/C60的组分比例。用原子力显微镜观察了薄膜表面的形貌即高度分布,分析了薄膜表面粗糙度的动力学标度行为,比较了两种温度下的动力学和静力学标度指数。The vacuum vapor deposit method was employed to prepare a series of Ag/C 60 mutilayers on the NaCl substrates,at room temperature (RT) and 160℃.The structures of the films were studied by a Transmission Electron Microscope (TEM).The surfaces of the films grown at RT were smooth without any rought structure,while C 60 is amorphous.There were distinct interface diffusion between Ag and C 60 in the films grown at 160℃ substrate temperature,with characteristic patterns structures observed.The topography of the films were scanned by an Atom Force Microsocope(AFM).The kinetic scaling behavior of the roughness of the film surfaces were studied and static and dynamic scaling exponents were obtained,which provide insight to the thermodynamic growth model of the C 60 /metal system.
关 键 词:薄膜 表面 粗糙度 碳60 银 TEM AFM 复合材料
分 类 号:TB333[一般工业技术—材料科学与工程] TB43
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