YBCO/CeO_2/LaAlO_3夹层膜的界面研究  

A STUDY OF THE INTERFACES OF YBCO/CeO 2/LaAlO 3 THIN FILMS

作　　者：马平[1] 杨坚[1] 古宏伟[1] 陈岚峰[1] 李灏[1] 刘振祥[2] 

机构地区：[1]北京有色金属研究总院 [2]中国科学院物理研究所

出　　处：《物理学报》1997年第1期198-202,共5页Acta Physica Sinica

摘　　要：用俄歇电子能谱（ＡＥＳ）结合透射电子显微镜（ＴＥＭ）对磁控溅射法制备的ＹＢＣＯ／ＣｅＯ２／ＬａＡｌＯ３夹层膜中的元素在各层间的扩散行为进行了研究．结果表明，ＣｅＯ２作为一种缓冲层，能够阻挡住基底ＬａＡｌＯ３中元素向ＹＢＣＯ膜的扩散和ＹＢＣＯ膜中元素向基底的扩散，其本身向ＹＢＣＯ膜中的扩散也不多．ＴＥＭ的分析表明，ＣｅＯ２能保持完好的晶格结构。Abstract The diffusion of elements among the layers of YBCO/CeO 2/LaAlO 3 films prepared by magnetron sputtering have been studied by Auger electron spectroscopy(AES).The results show that the CeO 2 buffer layer can prevent the elements in the LaAlO 3 substrate from permeating into the YBCO film and vice versa,whilst there was little or no diffusion of elements occuring from the CeO 2 into the YBCO layer.A TEM photograph shows that the CeO 2 can remain a good lattice structure on which high quality YBCO film with c axis orientation can be grown.

关 键 词：YBCO 超导体 夹层膜 薄膜 

分 类 号：TM262.014[一般工业技术—材料科学与工程]