Micro-Friction and Adhesion Measurements for Si Wafer and TiB_2 Thin Film  

作　　者：卿涛 邵天敏 温诗铸 

机构地区：[1]State Key Laboratory of Tribology,Department of Precision Instruments and Mechanology,Tsinghua University

出　　处：《Tsinghua Science and Technology》2007年第3期261-268,共8页清华大学学报（自然科学版（英文版）

基　　金：the National Natural Science Foundation of China (No. 50475012);the National Key Basic Research and Devel-opment (973) Program (No. 2003CB716201)

摘　　要：An apparatus was specifically developed for micro-friction and adhesion measurements. The force measurement range is 10-2000 μN with a horizontal speed of 10-400 μm/s. The apparatus was tested using a 0.7-mm diameter steel ball as the upper specimen to measure the micro friction and adhesion behaviour of a Si （100） wafer and a TiB2 film. The effects of rest time, speed, and load were studied. The results show that the maximum static and sliding friction forces of both the Si （100） wafer and the TiB2 film increase with the load. At low speeds, the influence of speed on the friction force is significant. The adhesion forces of the Si （100） wafer and the TiB2 film increase with rest time, reaching stable values after about 3000 s. The TiB2 film has significantly less adhesion and micro friction forces than the Si （100） wafer.An apparatus was specifically developed for micro-friction and adhesion measurements. The force measurement range is 10-2000 μN with a horizontal speed of 10-400 μm/s. The apparatus was tested using a 0.7-mm diameter steel ball as the upper specimen to measure the micro friction and adhesion behaviour of a Si （100） wafer and a TiB2 film. The effects of rest time, speed, and load were studied. The results show that the maximum static and sliding friction forces of both the Si （100） wafer and the TiB2 film increase with the load. At low speeds, the influence of speed on the friction force is significant. The adhesion forces of the Si （100） wafer and the TiB2 film increase with rest time, reaching stable values after about 3000 s. The TiB2 film has significantly less adhesion and micro friction forces than the Si （100） wafer.

关 键 词：micro friction ADHESION apparatus Si wafer TiB2 film 

分 类 号：TH873.6[机械工程—仪器科学与技术]