EFFECTS OF TREATMENT TEMPERATURE ON THE MICROSTRUCTURE AND MAGNETIC PROPERTIES OF Fe-N THIN FILMS  

作　　者：B.L. Li H.M. Du X.F. Wang E.Y. Jiang Z.Q.Li P. Wu 

机构地区：[1]Department of Applied Physics, Institute of Advanced Materials Physics, School of Science, Tianjin University, Tianjin 300072, China [2]Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Tianjin University, Tianjin 300072, China

出　　处：《Acta Metallurgica Sinica(English Letters)》2007年第4期293-300,共8页金属学报（英文版）

基　　金：supported by the National Natural Science Foundation of China(No.50674071);Tianjin Natural Science Foundation of China(No.06YFJZJC01300);the Program for New Century Excellent Talents in University(NCET-06-0245);the Platform Project of Tianjin for Innovation in Science and Technology and Environmental Construction(No.06TXTJJC13900).

摘　　要：Fe-N thin films were fabricated on both 100Si and NaCl substrates by RF magnetron sputtering under low nitrogen partial pressure. The microstructure and magnetic properties of Fe-N thin films were investigated with the increase of the substrate temperature （Ts） and the annealing temperature （Ta）. It is more difficult for nitrogen atoms to enter the Fe lattice under higher Ts above 150℃. The phase evolution is visible at higher Ta above 200℃. The phase transformation of α＇＇-Fe16N2 occurred at 400℃. The change of crystal size with Ta was clearly visible from bright and dark field images. The clear high-resolution electron microscope （HREM） images of 110α, 111γ＇, 112α＇＇, and 200α＇＇ phases were observed. The interplanar distances from TEM （transmission electron microscope） and HREM match the calculated values very well. From the results of the vibrating sample magnetometer （VSM）, the good magnetic properties of Fe-N films were obtained at 150℃ of Ts and 200℃ of Ta, respectively.Fe-N thin films were fabricated on both 100Si and NaCl substrates by RF magnetron sputtering under low nitrogen partial pressure. The microstructure and magnetic properties of Fe-N thin films were investigated with the increase of the substrate temperature （Ts） and the annealing temperature （Ta）. It is more difficult for nitrogen atoms to enter the Fe lattice under higher Ts above 150℃. The phase evolution is visible at higher Ta above 200℃. The phase transformation of α＇＇-Fe16N2 occurred at 400℃. The change of crystal size with Ta was clearly visible from bright and dark field images. The clear high-resolution electron microscope （HREM） images of 110α, 111γ＇, 112α＇＇, and 200α＇＇ phases were observed. The interplanar distances from TEM （transmission electron microscope） and HREM match the calculated values very well. From the results of the vibrating sample magnetometer （VSM）, the good magnetic properties of Fe-N films were obtained at 150℃ of Ts and 200℃ of Ta, respectively.

关 键 词：Fe-N thin film magnetic property HREM α＇＇-Fe16N2 

分 类 号：O484.43[理学—固体物理]