电沉积Ni-20%Fe(质量)磁性合金箔工艺的研究  

Investigation on Electroplating Conditions of Ni-20wt%Fe Magnetic Alloy Foil

作　　者：刘天成[1] 卢志超[1] 李德仁[1] 卢燕平[2] 孙克[1] 周少雄[1] 

机构地区：[1]钢铁研究总院安泰科技股份有限公司,北京100081 [2]北京科技大学材料科学与工程学院,北京100083

出　　处：《金属功能材料》2007年第4期1-5,共5页Metallic Functional Materials

基　　金：国家高技术研究发展计划(863计划)资助项目(2003AA30251);北京市科技计划资助项目(D0405003040121)

摘　　要：在硫酸盐-氯化物溶液体系中采用电沉积法制得了光亮Ni-Fe软磁合金箔,研究了n(Ni2+)/n(Fe2+)摩尔比,电流密度,镀液pH,镀液温度对电沉积Ni-Fe合金箔的铁含量的影响规律,确定了最佳工艺条件。验证性实验结果表明,在最佳工艺条件下制备的Ni-Fe合金箔是纳米晶合金,其Ni,Fe含量分别为80.4%(质量)和19.6%(质量)。这种合金箔外观平整、致密,具有明显的层状结构,其饱和磁通密度(Ms)为94.23emu/g,剩余磁通密度(Mr)为4.33emu/g,矫顽力(Hc)为5.08Oe。Bright Ni-Fe soft-magnetic alloy foil was prepared from sulphate-chloride bath solution by electropla- ting. The influence of n（Ni^2＋）/n（Fe^2＋） mole ratio, current density, pH and bath temperature on the content of Fe in the electrodeposited Ni-Fe alloy foil were investigated, and finally optimization technical conditions was found. Repeated experiment results shows that the Ni-Fe alloy foil plated with optimization conditions has nano-structure, chemical composition of the deposit is consisted of Ni 80. 4wt% and Fe 19.6wt%. The alloy foil was fine, uniform and obvious layer structure. The saturation flux density （M,）, residual flux density （Mr） and coercivity （Ho） for the electroplated Ni-20wt%Fe alloy samples were respectively 94.23emu/g, 4.33emu/g and 5.08Oe.

关 键 词：合金电镀 Ni-Fe软磁合金 箔 

分 类 号：TQ153.2[化学工程—电化学工业]