热处理对溅射FeSiAl膜结构及磁性的影响  

Effects of Heat Treatment on the Structure and Magnetic properties of Sputtered FeSiAl Films

作　　者：肖春涛[1] 耿胜利[1] 刘建中 杨正 

机构地区：[1]兰州大学物理系,兰州730000

出　　处：《磁性材料及器件》1997年第2期4-6,共3页Journal of Magnetic Materials and Devices

摘　　要：在真空度10－2Pa以上的条件下对溅射FeSiAl膜进行了两小时真空退火热处理。发现样品的相结构并未因此而改变，但热处理过程中的晶粒长大和应力消除明显改善了溅射膜的软磁性能。另外，退火FeSiAl膜的有效磁导率μeff直到10．5MHz都没有出现下降趋势，表现出优良的高频性能。Sputtered FeSiAl films were annealed in vacuum for two hours with thepressure lower than 10-2Pa. It was found that the phase structure was not changed during the heattreatment,but the soft magnetic properties of sputtered films were greatly improved by the growthof grains and the release of strains in the process of annealing. Moreover,the effective permeabilityueff of annealed FeSiAl films didn' t incline to decrease up to 10.5MHz. Excellent high frequencyPerformance was obtained.

关 键 词：真空退火 结构 磁性能 磁头材料 

分 类 号：TQ587.5[化学工程—精细化工]