退火工艺对溶胶凝胶Pb(Zr_(0.52)Ti_(0.48))O_3薄膜残余应力的影响  

Effect of annealing conditions on residual stress in sol-gel-derived Pb(Zr_(0.52)Ti_(0.48))O_3 film

作　　者：杨帆[1] 费维栋[2] 李伟力[2] 高忠民[3] 蒋建清[1] 

机构地区：[1]东南大学材料科学与工程学院,江苏南京211189 [2]哈尔滨工业大学材料科学与工程学院,黑龙江哈尔滨150001 [3]吉林大学化学学院,吉林长春130012

出　　处：《功能材料》2007年第8期1260-1264,共5页Journal of Functional Materials

基　　金：江苏省博士后科研资助项目(0602001A)

摘　　要：使用溶胶凝胶法制备了Pb(Zr0.52Ti0.48)O3铁电薄膜,分别利用原子力显微镜、X射线衍射及面探扫描技术分析了薄膜的组织结构,并运用掠入射X射线衍射法研究了不同工艺条件下制备的薄膜的残余应力。研究表明溶胶凝胶薄膜在600℃退火30min后完全晶化,组织结构均匀。不同工艺下制备的薄膜均受残余拉应力,随着退火温度及退火时间的延长,薄膜中的残余应力逐渐增大,而随着薄膜厚度的增加,残余应力先增大然后减小。　Pb（Zr0.52Ti0.48）O3 ferroelectric thin films were prepared by a modified sol-gel process.The microstructures and compositions of the film were analyzed by atomic force microscopy and X-ray diffraction and two-dimensional diffraction technique,respectively.The residual stresses of the PZT films were measured by grazing incidence X-ray diffraction.The PZT films were smooth with low roughness,and were well crystallized by annealing at 600℃ for 30min.The XRD results showed that sol-gel PZT films were in tension;and the residual stresses in PZT film increased with growing annealing temperature and annealing interval;and that with the increasing of film thickness, the residual stress firstly increased and then decreased in thicker film.

关 键 词：溶胶凝胶法 X射线衍射 残余应力 退火 

分 类 号：TM22[一般工业技术—材料科学与工程] TN305[电气工程—电工理论与新技术]