不锈钢管道低温溅射镀TiN薄膜技术  

Technology of coating TiN film on inner face of stainless steel pipe by sputtering at low temperature

作　　者：张耀锋[1] 王勇[1] 尉伟[1] 王建平[1] 范乐[1] 蒋道满[1] 朱存宝[1] 刘祖平[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,合肥230029

出　　处：《强激光与粒子束》2007年第8期1381-1384,共4页High Power Laser and Particle Beams

基　　金：国家自然科学基金资助课题(10245002)

摘　　要：设计了一套适用于加速器细长管道真空室的低温溅射镀TiN薄膜装置。利用该装置，对Ф86mm×2000mm的不锈钢管道真空室进行溅射镀TiN膜实验，并对镀膜实验结果进行分析，得到了适用于加速器管道真空室内壁溅射镀TiN膜的表面处理参数。样品测试结果表明：在压强为80～90Pa、基体温度为160～180℃的镀膜参数下，不锈钢管道内壁获得的TiN薄膜最佳，薄膜沉积速率为0．145nm／s。镀膜后真空室的二次电子产额明显降低。A surface treatment setup of coating TiN film on the inner face of stainless steel pipe vacuum chamber for accelerators at low temperature is described. A series of surface treatment parameters have been achieved through many coating experiments on a stainless steel pipe which is 86 mm in diameter and 2 000 mm in length. The test results show that TiN film of the best quality could be coated on the inner face of stainless steel pipe under 80-90 Pa and 160-180 ℃, and the deposition rate achieves 0. 145 nm/s. The secondary electron yield of the coated chamber decreases distinctly compared with that of the uncoated chamber.

关 键 词：低温直流溅射 TIN膜 不锈钢真空室 二次电子产额 加速器 

分 类 号：TB741[一般工业技术—材料科学与工程] TN305.92[一般工业技术—真空技术]