飞秒激光作用下薄膜破坏的力学过程  

The dynamic process of thin films damage induced by femtosecond laser

作　　者：张红鹰[1] 吴师岗[1] 

机构地区：[1]山东理工大学材料科学与工程学院,淄博255049

出　　处：《物理学报》2007年第9期5314-5317,共4页Acta Physica Sinica

摘　　要：提出了等离子体膨胀的力学模型,在等离子体膨胀过程中考虑了球壳膨胀时的惯性效应,实现了动态特性的模拟.采用能量守恒原理,研究了薄膜中等离子体受限制爆炸的薄膜损伤机理的力学特性,并对薄膜损伤的发展作了初步探讨.A dynamic model of plasma explosion is put forward. The inertia factor is considered daring plasma expansion, and the dynamic simulation is carried out. The dynamic mechanism of film damage induced by plasma blast is discussed. Damage development of thin film is preliminarily investigated.

关 键 词：等离子体 膨胀 薄膜 激光 

分 类 号：O484.2[理学—固体物理]