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作 者:王福吉[1] 贾振元[1] 全芳瑶[1] 刘巍[1]
机构地区:[1]大连理工大学机械工程学院,辽宁大连116024
出 处:《装备制造技术》2007年第8期3-5,11,共4页Equipment Manufacturing Technology
基 金:国家自然科学基金资助项目(50605005;50275021);辽宁省科学技术基金资助项目(20032121);新世纪优秀人才支持计划资助项目(NETC-04-0265)。
摘 要:间接耦合式超磁致伸缩薄膜是一种新兴的具有优异机械物理性能的功能材料,已成为微型器件材料研究的热点之一。由于是在弹性基片上通过物理沉积方法得到该种薄膜材料,因此基片的物理性能对薄膜材料的磁化性能会产生重要影响。通过对物理性能差异较大的铜、聚酰亚胺两种基片的间接耦合式超磁致伸缩薄膜的磁化曲线、饱和磁化强度等进行实验研究与分析比较,得到不同物理性能基片对超磁致伸缩薄膜特性的影响规律,为进一步制备性能各异的薄膜材料奠定基础。Indirect coupled Giant magnetostrictive thin film (GMF) as a new functional material with excellent mechanical and physical characters has been one of the hotspot in the area of micro-devices materials. The physical properties of substrate has important impact on the magnetization properties of the film material, since which is got by the method of physical deposition on the elastic substrate. By the research and analysis comparison of indirect coupled GMF, including magnetization curve, saturation magnetization intensity, magnetization anisotropic and so on, the influence regularity of different physical performances of substrate on that of GMF has been reached between Cu substrate and PI substrate-two materials with great diversity in physical properties, and the basis has been established for the further preparation of film material with diverse characters.
分 类 号:TM271[一般工业技术—材料科学与工程]
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