研究光刻废水中二苯甲酮的处理方法及降解过程  

A Study on the Degradation Method and Process of Diphenyl Ketone in Lithographic Waste Water

作　　者：闻瑞梅[1] 葛伟伟[1] 

机构地区：[1]上海同济大学电子信息工程学院,上海200092

出　　处：《电子学报》2007年第8期1437-1441,共5页Acta Electronica Sinica

摘　　要：研究185nmUV对二苯甲酮浓度的降低和TOC(Total Organic Carbon)的去除方法.用185nm紫外及254nm紫外对光刻废水中二苯甲酮处理效果的对比.同时还研究了废水中二苯甲酮的降解过程及中间产物.The degradation method of diphenyl ketone and TOC（Total Organic Carbon） in lithographic waste water. By using 185nmUV irradiation has been studied. The effectiveness of diphenyl ketoneby 185nmUV and 254 nmUV irradiation has been compared. In addition the intermediate products and process have been investigated. The aim of abatement of diphenyl ketone waste water was achieved.

关 键 词：185nm紫外 254nm紫外 二苯甲酮 降解过程 中间产物 

分 类 号：TN304[电子电信—物理电子学]