高重复率铜蒸汽激光的充氢机制  

MECHANISMS OF ADDITIVE HYDROGEN FOR HIGH REPETITION RATE COPPER VAPOR LASERS

作　　者：程成[1] 孙威[2] 

机构地区：[1]杭州师范学院物理系 [2]浙江大学物理系

出　　处：《物理学报》1997年第5期897-907,共11页Acta Physica Sinica

摘　　要：通过数值求解时空自洽的铜蒸汽激光动力学方程，详细研究了铜激光的充氢机制．少量充氢提高激光功率的原因是：１）氢具有的大热导率使管壁温度升高，铜粒子数密度增加；２）充氢增加了电子与氢的动量输运碰撞，使放电电流减小．当电源功率一定时，闸流管的功率损耗减小，输入激光管的功率增大．此外，充氢过多（大于（１—２）％氖），通过电子碰撞激发氢分子振动能级，使电子温度和电子密度下降较大，电子没有足够的能量密度激励激光能级。We present a detailed study on the mechanisms of additive hydrogen for high repetition rate copper vapor lasers by solving the kinetics equations of self consistency in space time.The mechanisms of the increasing output power by adding small partial pressures of gaseous hydrogen to neon buffer gas are that: (1) the overall copper particles density is increased as the wall temperature increased; (2) the discharge current and the deposited power in the thyratron are decreased while maintaining the same stored input power,and making input power increased.On the other hand,when the additive hydrogen is superfluous (>(1—2)% neon) the plasma electron temperature and electron density decrease obviously owing to the vibrating excitation of hydrogen molecules impacted by the electron,and in this case the laser power decreases.

关 键 词：铜蒸汽 激光动力学 充氢 

分 类 号：TN241[电子电信—物理电子学]