制备光致抗蚀剂光栅掩膜的衍射控制技术  

Diffraction Monitoring Technique for FabriCating Photoresist Grating Masks

作　　者：李燕[1] 徐迈[1] 王淑荣 马长虹 

机构地区：[1]中国科学院长春物理所

出　　处：《光学机械》1990年第3期17-20,共4页

摘　　要：通过显影过程对光致抗蚀剂光栅负一级衍射效率的观测,实现了分布反馈(DFB)光栅掩膜槽深和形状的最佳控制。该技术适用于各种集成光学波导光栅的制备。The optimum conditions for monitoring grooves and configurations of the photoresist grating masks are obtained by the observation of the negative first-order diffraction efficiency during development. This technique can be used for fabricating various waveguide gratings for integrated optics.

关 键 词：半导体激光器 光栅掩膜 衍射控制 

分 类 号：TN248.4[电子电信—物理电子学]