Cu/Ni多层膜的调制波长与力学性能的关系  

Relationship between the wavelength and the mechanical properties of Cu/Ni multilayers

作　　者：程东[1] 严志军[1] 严立[2] 高玉周[2] 

机构地区：[1]大连海事大学轮机工程学院,辽宁大连116026 [2]大连海事大学机电与材料工程学院,辽宁大连116026

出　　处：《大连海事大学学报》2007年第3期122-124,共3页Journal of Dalian Maritime University

基　　金：国家自然科学基金资助项目(50071014);交通部博士学位资助项目(200232522504)

摘　　要：为研究Cu/Ni多层膜的调制波长与力学性能的关系,采用计算机控制的单槽双脉冲控电位沉积系统,在Cu基体上沉积Cu/Ni多层膜,分别采用扫描电镜和纳米压痕技术对Cu/Ni多层膜的截面和硬度进行了测试.结果表明:电沉积方法制备的Cu/Ni多层膜具有良好的周期结构;在调制波长为37 nm时硬度达到极值;在调制波长小于37 nm时其硬度值明显下降.实验结果符合理论分析中多层膜的硬度随调制波长的变化规律,但临界调制波长大于理论计算结果.Cu/Ni multilayers were prepared on Cu substrate by a single-bath electrodeposition method to study the relationship between the wavelength and the mechanical properties of multilayers. Their microstructures and mechanical properties were tested using scanning electron microscopy（SEM） and nanoindentation equipment. The results show that the Cu/Ni multilayers electrochemically synthesized in a single bath have obvious alternating layers of Cu and Ni-Cu. The hardness of Cu/Ni multilayers reaches its peak when the wavelength is 37 nm, and decrease rapidly when the wavelength is smaller than 37 nm. The experimental results are in good agreement with the theoretical analysis. But the critical wavelength is larger than the theoretical value.

关 键 词：Cu/Ni多层膜 调制波长 力学性能 电化学沉积 单槽法 

分 类 号：O484.5[理学—固体物理]