电化学合成的含双键聚硅烷  

Polysilane with Double Bonds by Eelctrochemical Synthesis

作　　者：吴市[1] 陈来[1] 张峰君[2] 范雪骐[1] 任慕苏[1] 孙晋良[1] 

机构地区：[1]上海大学材料科学与工程学院,上海201800 [2]安徽建筑工业学院材料系,安徽合肥230022

出　　处：《高分子材料科学与工程》2007年第5期64-67,共4页Polymer Materials Science & Engineering

摘　　要：采用电化学合成法,将甲基三氯硅烷与烯丙基氯进行聚合,合成出带有双键的聚硅烷,通过FT-IR,UV,1H-NM R,GPC表征了其结构,测定了产物的双键含量,并对产物进行了交联固化和高温裂解实验。结果表明,产物中双键保留率为8.2%,双键的引入使聚硅烷获得了很高的质量保留率及较高的陶瓷产率。A polysilane with double bonds was synthesized by electrochemical method, using methyltrichlorosilane and allyl chloride as monomers. The product was characterized by FT-IR, UV, 1H-NMR, GPC. Its double-bond content was determined. The cross-linking and pyrolysis of it were studied. The results show that the retaining ratio of double bonds is 8.2%. The introduction of double bonds in polysilane brings forth much higher mass retaining ratio and better ceramic yield.

关 键 词：聚硅烷 双键 电化学合成 

分 类 号：TQ317[化学工程—高聚物工业]