表面硅微器件中掩膜和工艺流程的自动生成方法  

Automated Generation of Mask and Process Flow for Surface Micromachined Devices

作　　者：张长富[1] 任泰安[1] 卢德江[1] 蒋庄德[1] 

机构地区：[1]西安交通大学机械制造系统工程国家重点实验室

出　　处：《西安交通大学学报》2007年第9期1031-1035,共5页Journal of Xi'an Jiaotong University

基　　金：国家自然科学基金重点资助项目(50535030);国家重点基础研究发展规划资助项目(2004CB619302)

摘　　要：为消除目前手工设计掩膜和工艺流程的繁琐过程,提出了一种从表面硅微器件的三维结构模型自动生成掩膜和工艺流程的方法.该方法将三维器件模型作为输入,根据其组成特征的几何信息和材料信息识别出基底层、结构层、牺牲层和金属层等所有工艺层,再根据工艺层的结构特点和材料信息自动生成掩膜和工艺流程,并利用SolidWorks软件用户接口开发的应用程序验证了方法的可行性.应用实例表明,该方法不仅可以使设计者专注于器件结构本身的设计,而且易于实现掩膜和工艺流程的自动化生成,比传统的手工设计方法更加直观、高效,为相应的设计工具开发提供了理论分析和实验验证.To get rid of the abstract and tedious design of the current methodology, a new generation method of mask and process flow for surface micromachined devices is proposed, where the constructed 3D geometric models are employed to recognize and generate basic process layers, such as silicon substrate layers, structural layers, sacrificial layers and metal layers, by analyzing the 3D component features and material information. The mask and process flow are automatically generated from the basic layers according to the geometric characteristics and material information, and a program is developed through the application programming interfaces of SolidWorks to verify the method. A practical example shows that this method is effective and straightforward to obtain mask and process flow from the constructed geometric models of surface micromachined devices.

关 键 词：表面硅微器件 掩膜 工艺流程 生成方法 

分 类 号：TP311.56[自动化与计算机技术—计算机软件与理论]