电泳法制备四针状纳米ZnO场发射阴极  

Fabrication of Field Emission Cathode of Tetrapod-like ZnO Film by Electrophoretic Deposition

作　　者：陈锦[1] 郭太良[1] 

机构地区：[1]福州大学光电显示技术研究所,福建福州350002

出　　处：《液晶与显示》2007年第4期407-411,共5页Chinese Journal of Liquid Crystals and Displays

基　　金：国家"863"计划平板显示重大专项基金(No.2005AA303G10);福建省科技重大专项基金(No.2004HZ01-2);福建省自然科学基金重点项目(No.A0420001)

摘　　要：用电泳法成功地将四针状纳米ZnO沉降在透明导电玻璃ITO衬底上,制备出13cm×10cm面积的场发射阴极屏。使用扫描电子显微镜观察ZnO颗粒的表面形貌及分散均匀性。结果表明电泳法制得的ZnO场发射阴极屏透明且颗粒分布较均匀。讨论了电泳电压、沉降时间、电泳液浓度对阴极场发射电流的影响,通过实验得出用电泳法转移四针状纳米氧化锌制作阴极屏的最佳工艺条件,即直流电压75V、电泳时间为8min,两极距离2.5cm条件下制得的屏场发射性能较佳,显示效果较好。测试了ZnO阴极屏在1200V直流电压下长时间发射稳定性,测试过程电流波动范围小于5%。实验表明采用电泳法制备场发射阴极具有工艺简单、步骤少、易操作、成本低并能根据需要控制薄膜厚度及场发射屏面积等优点,对于大屏幕、低成本FED的研发具有实际应用意义。Large-area thin films of terapod-like ZnO were successfully deposited on the conductive glass substrate indium tin oxide （ITO） by eleetrophoretie deposition（EPD）. The films were thin and uniform which were eharaeterized by scanning electron mieroseopy（SEM）. In the work the process parameters such as bias voltage, salt condition and deposition time were optimized to achieve the best cathodes. In the case, the voltage was in the range of about 75-80 V. And the EPD process was maintained about 8 rain while the distances between the two electrodes was about 2.5 cm . The results show that the EPD ZnO cathodes have high emission current and luminescence uniformity. And the eleetrophoretie method, which is cost-effective and simple proeess, has practicability to fabricate large-area uniform field emission arrays.

关 键 词：场致发射显示 纳米材料 电泳沉积 四针状ZnO 

分 类 号：TN873.93[电子电信—信息与通信工程]