应用长宽等比约束的半球面纹理映射算法  

Algorithm of Hemisphere Texture Mapping Applying Constraint of Equal Ratio of Length and Breadth

作　　者：唐勇[1] 刘连军[1] 吕梦雅[1] 

机构地区：[1]燕山大学信息科学与工程学院,秦皇岛066004

出　　处：《系统仿真学报》2007年第18期4209-4211,共3页Journal of System Simulation

基　　金：国家自然科学基金(60474044);河北省自然科学基金(F2006000267)。

摘　　要：在两步纹理映射算法中,半球面是使用较多的一种中介面。为了进一步减少半球面映射算法产生的纹理形变,首先对传统的半球面纹理映射算法及其不足之处进行分析,并在此基础上提出一种半球面纹理映射新算法。该算法用映射纹理区在纹理平面和半球面上的长宽比为约束条件,显著提高了纹理映射质量。通过理论分析和实验对新算法与传统算法进行比较,表明新算法具有一定优势。The hemispherical surface is an important intermediary surface used in two-part texture mapping algorithm. In order to further reduce the texture distortion which was caused by the algorithm of hemispherical surface mapping, the algorithm of traditional hemispherical texture mapping and its deficiency were discussed, A new algorithm of hemisphere texture mapping was put forward, in which the ratio of length and width corresponding to the mapped texture regions in the texture plane and the hemisphere was taken as the constraint, and the quality of texture mapping was remarkably improved, Comparison has been made through the theoretical analysis and the experiment result between the new algorithm and the traditional algorithm, which shows the new algorithm has its superiority.

关 键 词：纹理映射 半球面纹理映射算法 两步纹理映射 纹理变形 

分 类 号：TP391.9[自动化与计算机技术—计算机应用技术]