超宽带增透膜新的设计法  

New Design of Super Wide Bandwidth Antireflection Film

作　　者：黄光伟[1] 田维坚[1] 卜江萍[1] 

机构地区：[1]中国科学院西安光学精密机械研究所,西安710068

出　　处：《光子学报》2007年第9期1694-1696,共3页Acta Photonica Sinica

摘　　要：在设计超宽带增透膜时提出一种新的设计方法,使用这种设计方法来设计在400 nm～1800nm波段内实现增透,同时将其设计结果与使用传统设计方法设计的结果相比较,发现在400nm～1 800 nm波段内使用这种新的设计方法可以将其反射率值控制在2 %以下.这种方法解决了在设计超宽带增透膜时传统的设计方法不能解决的难题.A new design way is put forward when designing super wide bandwidth antireflection film, use this way to design the antireflection film which the wavelength from 400 nm-1800 nm. By comparing this way with traditional way,it can be found that within 400 nm-1800 nm the reflectance can be controlled under 2%. But this could not be done with traditional way. So this method overcomes the difficulty that cannot be resolved with traditional ones when designing the super wide bandwidth antircflection film.

关 键 词：超宽带 增透膜 镀膜 反射率 

分 类 号：O484.4[理学—固体物理]