相位掩模版接缝相差对光栅反射峰的影响  

Impact of phase masks' stitching errors on the reflectivity of the chirped fiber Bragg grating

作　　者：宁提纲[1,2] 胡旭东[1,2] 李坚[1,2] 郑晶晶[1,2] 张帆[1,2] 王春灿[1,2] 耿蕊[1,2] 

机构地区：[1]全光网络与现代通信网教育部重点实验室,北京交通大学,北京100044 [2]北京交通大学光波技术研究所,北京100044

出　　处：《光电工程》2007年第9期93-96,共4页Opto-Electronic Engineering

基　　金：国家自然科学基金;北京市自然科学基金(4052023);教育部新世纪优秀人才支持计划(NCET-06-0076);北京交通大学校科技基金(2006xm003)资助

摘　　要：电子束刻蚀啁啾相位掩模版采用的是分步啁啾的方法,而掩模版制造过程中分步之间的接缝误差是啁啾光纤光栅反射峰不平坦的一个重要因素。本文以不同分步步长,总长度140mm的相位掩模版为例,理论分析和比较了不同接缝误差对啁啾光纤光栅反射峰的影响。分析表明,最大相位误差为3°和7°时,光栅反射峰波动的统计平均分别为0.98%和2.31%。进行相关试验研究以上相位掩模版写入光栅的反射特性,得出结论与理论分析一致。The chirped electron-beam written phase mask is fabricated by using step-chirped method, The step-chirped phase mask is a useful and powerful device for realizing a nonlinearly or linearly stepwise chirped fiber grating with a broad bandwidth. But the stitching errors of electron-beam written phase masks always occur between neighboring sections, which can impact the reflectivity fluctuation of chirped Fiber Bragg Gratings （FBGs）. The 140-mm-length chirped FBGs, which are written by using l mm-stepwise chirped phase mask, are studied by simulation and experiment. The simulation results agree well with those of the experiment.

关 键 词：光纤通信 啁啾光纤光栅 相位掩模版 接缝误差 反射峰波动 

分 类 号：TN929.1[电子电信—通信与信息系统]