金刚石表面镀覆金属钨的新方法  

Novel method for coating tungsten on diamond

作　　者：向波[1] 谢志刚[1] 贺跃辉[1] 黄艳华[1] 

机构地区：[1]中南大学粉末冶金国家重点实验室,长沙410083

出　　处：《中国有色金属学报》2007年第9期1511-1515,共5页The Chinese Journal of Nonferrous Metals

基　　金：广西科学研究与技术开发计划资助项目(桂科能05112001-2B1)

摘　　要：研究在金刚石表面镀覆金属钨的新方法，即通过采用H2／H20混合气体在750-900℃下还原含催化剂的钨的氧化物，利用钨的氧化物在水蒸气中的挥发特性及其化学气相传输，在金刚石表面镀覆金属钨。结果表明，该方法可在金刚石表面镀覆上一层覆盖面达到90％以上的金属钨膜，且生成稳定的碳化物WC和w2C，得到由难熔金属钨包覆的金刚石。A novel method for coating tungsten on diamond was put forward. In the method, using the volatilization of tungsten oxides in water vapor and chemical vapor transport, the tungsten coating on diamond was obtained by reducing the activator doped tungsten oxide powders in the atmosphere mixture of H2/H20 at 750-900 ℃. The morphology was observed by scanning electronic microscope and the phase composition was analysed by X-ray diffraction. The results show that the coverage area of tungsten film on diamond surface is above 90% and the steady tungstenic carbides WC and W2C are created by this technology. The tungsten film coated on diamond is realized.

关 键 词：金刚石 钨 镀覆 

分 类 号：TQ164[化学工程—高温制品工业]