变化电压下扩散限制电解沉淀过程对铜的分形维数的影响  

Fractal dimension of Cu in diffusion-limited electrolytic deposition process under varied voltages

作　　者：曹亦铮[1] 徐碧漪[1] 江洪建[2] 苏为宁[2] 周惠君[2] 

机构地区：[1]南京大学基础学科强化部,江苏南京210093 [2]南京大学物理系,江苏南京210093

出　　处：《物理实验》2007年第9期3-7,10,共6页Physics Experimentation

基　　金：国家基金委物理学人才基地基金(No.j0630316)

摘　　要：研究了铜的二维电解沉淀物在限制条件下的分形维数.拍摄了铜沉淀物随时间变化的照片,使用盒维法分析了各种条件下的豪斯多夫分形维数,并建立了计算机评估模型,以证明电压对豪斯多夫维数的重要影响.根据照片显示沉淀物的欧几里德几何形状也有着规则的变化.Fractal dimensions of two-dimensional electro-deposited Cu under limited conditions are investigated through a series of controlled experiments. In the experiment, time-related photos of the Cu deposit patterns are taken. To quantify the change in relation with the voltage, Hausdorff dimensions in each condition are analyzed with a box-counting method. A model is also established with computer evaluation which proofs that the voltage plays an important role in determining the Hausdorff dimension. Moreover, the general Euclidian geometric shapes of the deposit vary in a regular way according to the photos.

关 键 词：分形 豪斯多夫维数 电解沉淀 扩散限制 硫酸铜 

分 类 号：O415.5[理学—理论物理]