调制周期对TaN/VN纳米多层膜的影响  

Modulation Period and Nano TaN/VN Multilayers

作　　者：张学华[1] 曹猛[1] 杨瑾[1] 刘桐[1] 王明霞[1] 邓湘云[1] 李德军[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300074

出　　处：《真空科学与技术学报》2007年第5期367-369,共3页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金项目(No.50472026);天津市应用基础研究重点项目(No.043801011)

摘　　要：本研究选择钽和钒的氮化物作为个体层材料,利用射频磁控溅射系统制备TaN、VN及一系列的TaN/VN多层薄膜。通过XRD和纳米力学测试系统分析了该体系合成以后的晶体结构、调制周期对力学性能的影响。结果表明:多层膜的纳米硬度值普遍高于两种个体材料混合相的硬度值;当调制周期为30 nm时TaN/VN多层膜达到最大硬度31 GPa,结晶出现多元化,多层膜体系的硬度、弹性模量以及耐磨性能均达到最佳效果。TaN/VN multilayers with a nanoscale moderation periold were grown by RF magnetron sputtering.It microstructures and mechanical properties were characterized with X-ray diffraction（XRD）,a nano-indenter and a profiler. The results show that the multilayers have higher nanohardness than that of TaN, VN coatings,and their mixtures. The nanohardness of the multilayer,31 GPa, optimizes at a modulation period of 30 nm. Moreover, its elastic modulus and tribologieal property are also better than that of the multilayers with different modulation periods.

关 键 词：射频磁控溅射 TaN/VN多层膜 调制周期 

分 类 号：TG174.4[金属学及工艺—金属表面处理]