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出 处:《计算机集成制造系统》2007年第9期1839-1846,共8页Computer Integrated Manufacturing Systems
基 金:上海市科委重点资助项目(061612058);上海市科委重大资助项目(06DZ12001)~~
摘 要:介绍了XPDL 2.0规范和XPDL 1.0规范之间的差别;采用van der Aalst提出的20种工作流模式,着重分析了XPDL 1.0所不支持的九种过程控制模式,对其中XPDL 2.0支持的模式给出基于业务过程建模符号的图形示例和相应的XPDL 2.0代码实现示例。最后,揭示了XPDL 2.0规范在自身语义方面,以及与业务过程建模符号的语义一致性方面存在的问题。The difference between the specification of XPDL1.0 and XPDL2.0 was introduced. And then using a set of 20 basic workflow patterns proposed by van der Aalst, 9 kinds of control patterns that were not supported by XPDL1.0 specification were analyzed in particular. For the pattern supported by XPDL2.0, the Business Process Modeling Notation (BPMN)-based graphics demonstrations and the corresponding XPDL2.0 code realization were also provided. Finally, the semantic problems as well as the consistency problems with the BPMN specification involved in the XPDL2.0 specification were revealed.
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