镁合金在中性镀液中化学镀Ni-P合金研究  

Study on Electroless Ni-P Alloy Plating on Magnesium Alloy into Neutral Plating Bath

作　　者：陈志勇[1] 刘沙沙[1] 李忠厚[1] 

机构地区：[1]太原理工大学表面工程研究所,山西太原030024

出　　处：《新技术新工艺》2007年第9期72-74,共3页New Technology & New Process

基　　金：山西省科技攻关项目(2006031117-04);太原市大学生创新专项(07010763)

摘　　要：研究了无铬预处理和中性镀液中化学镀Ni-P合金工艺,利用光学图像分析仪、辉光放电光谱仪(GDS)、电子天平和X射线衍射(XRD)等检测方法,探讨了镁合金化学镀Ni-P合金镀层的截面形貌、镀速、成分和相结构。结果表明,镀层的平整度与镀前基体的光滑度具有密切的关系,镀层的含磷量在9.5%～11%之间,呈非晶态结构,但经回火热处理发现300℃左右开始发生晶化,400℃时晶化过程已经基本完成。另外,研究表明除温度对镀速有较大影响外,络合剂还具有调速特性。The pretreatment without chrome and the technics of electroless Ni-P alloy plating into neutral plating bath was investigated. By means of optical instrument of image analysis、GDS、electronic balance and XRD,the paper studies on cross-section morphology、plating rate、component and phase structure of electroless Ni-P alloy plating on magnesium alloy. It indicates that the planeness of plating layer and the smoothness of structure before plating have an intimate relation. Phosphorus content of plating layer which is between 9.5%～11% is amorphous structure,but after drawing temper the electroless plating layer starts crystallization at 300 ℃ or so,the crystallization process can almost finish at 400 ℃. In addition,the investigation shows that temperature has an obvious influence for plating rate,and complex agent also have timing characteristic.

关 键 词：化学镀 相结构 回火 镁合金 Ni—P合金 

分 类 号：TG173.1[金属学及工艺—金属表面处理]