非常规快速电沉积制备纳米材料的方法和原理  

Methods and Principle of Nanomaterials Preparation by Unconventional High Speed Plating

作　　者：于文忠[1] 俞宏英[1] 孙冬柏[1] 孟惠民[1] 樊自栓[1] 

机构地区：[1]北京科技大学腐蚀与防护中心,北京100083

出　　处：《装备环境工程》2007年第5期78-81,共4页Equipment Environmental Engineering

基　　金：北京市教委科技发展计划基金重点项目(KZ200410028012)

摘　　要：非常规电沉积利用镀液的流动,能极大地提高电沉积速度,因而利用非常规电沉积技术制备纳米晶材料具有较好的发展和应用前景。介绍了电刷镀、流镀、喷射电沉积、摩擦喷射电沉积等几种常见的非常规电沉积的方法和原理,指出了各种方法的优缺点,展望了非常规快速电沉积技术的应用前景。Unconventional plating can improve deposition rate greatly by flow of the electrolyte. There is a good prospect of preparing nanomaterlals by unconventional plating. The methods and principle of some unconventional high speed plating such as electro - brush plating, flow plating, and jet-electrodeposition were introduced. The developing prospect of these methods was also forecast.

关 键 词：纳米材料 非常规电沉积 镀液流动 快速电沉积 

分 类 号：TQ153[化学工程—电化学工业]