时间和电压对TC4合金表面等离子碳氮共渗层的影响  

The Effect of Time and Voltage on Plasma Carbonitriding Layer of TC4 Alloy

作　　者：柳永康[1] 谢发勤[1] 胡宗纯[1] 吴向清[1] 

机构地区：[1]西北工业大学航空学院,西安710072

出　　处：《中国表面工程》2007年第5期37-40,共4页China Surface Engineering

基　　金：陕西省科技计划项目(2006KG03)

摘　　要：应用液相等离子电解碳氮共渗技术,在NH4NO3、乙醇和甘油组成的电解液体系下,短时间内在TC4合金表面制备高硬度渗层。探索了时间和电压对膜层的硬度、厚度、相组织和微观形貌的影响。结果表明:随着时间的延长和工作电压的提高,渗层的硬度、厚度均有明显的提高,表面粗糙度变大。并得出了TC4合金进行等离子碳氮共渗的理想电压应控制在280V左右。The film of high hardness was made on TC4 alloy surface in a short time by plasma carbonitriding technique in electrolyte composed of ammonium nitrate, distilled water, absolute ethyl alcohol and glycerine. The influences of time and electric voltage on the film＇s hardness, thickness, phase composition and micro-structure were studied. The results showed that the fabricated film s hardness and thickness were increased along with time and electric voltage. At the same time, the film became rougher. The best voltage range of plasma electrolytic carbonitriding for TC4 alloy was obtained, it was 280V.

关 键 词：液相 等离子 碳氮共渗 

分 类 号：TG156.9[金属学及工艺—热处理]