Chemical Oxidation of La2CuO4 Epitaxial Thin Films Grown by Pulsed Laser Deposition  

作　　者：汪春昌 闰允杰 朱静 

机构地区：[1]Beijing National Center for Electron Microscopy, Tsinghua University, Beijing 100084 [2]Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084

出　　处：《Chinese Physics Letters》2007年第6期1674-1677,共4页中国物理快报（英文版）

基　　金：Support by the National Natural Science Foundation of China, the National Key Basic Research Programme of China, and the State Key Lab of New Ceramics and Fine Processes.

摘　　要：Chemical oxidation is used to induce superconductivity in La2CuO4 expitaxial thin films fabricated by pulsed laser deposition technique. Details about the influence of oxidation time on structural, surface morphology, Raman spectra, and electrical properties have been investigated. The results convince that successful uptake of oxygen occurs in the oxidized films, and the content of the inserted oxygen increases with increasing oxidation interval. The possible mechanism for the excess oxygen insertion into the film is also discussed.Chemical oxidation is used to induce superconductivity in La2CuO4 expitaxial thin films fabricated by pulsed laser deposition technique. Details about the influence of oxidation time on structural, surface morphology, Raman spectra, and electrical properties have been investigated. The results convince that successful uptake of oxygen occurs in the oxidized films, and the content of the inserted oxygen increases with increasing oxidation interval. The possible mechanism for the excess oxygen insertion into the film is also discussed.

关 键 词：ELECTROCHEMICAL OXIDATION SPIN FLUCTUATIONS THERMAL-TREATMENT RAMAN-SCATTERING SUPERCONDUCTIVITY TEMPERATURE INDUCTION NACLO EFFUSION 

分 类 号：O56[理学—原子与分子物理]