Analysis of Aberrations in Laser-Focused Nanofabrication  

Analysis of Aberrations in Laser-Focused Nanofabrication

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作  者:张文涛 张宝武 李同保 

机构地区:[1]Department of Physics, Tongji University, Shanghai 200092 [2]nstitute of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004

出  处:《Chinese Physics Letters》2007年第7期1890-1893,共4页中国物理快报(英文版)

摘  要:Based on the semi-classical model, we analyse the motion equation of chromium atoms in the laser standing wave field under the condition of low intensity light field using fourth-order Adams-Moulton algorithm. The trajectory of the atoms is obtained in the standing wave field by analytical simulation. The image distortion coming from aberrations is analysed and the effects on focal beam features are also discussed. Besides these influences, we also discuss the effects on contrast as well as the feature width of the atomic beam due to laser power and laser beam waist. The simulation results have shown that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width. Based on these analyse, we present some suggestions to minimize these influences.Based on the semi-classical model, we analyse the motion equation of chromium atoms in the laser standing wave field under the condition of low intensity light field using fourth-order Adams-Moulton algorithm. The trajectory of the atoms is obtained in the standing wave field by analytical simulation. The image distortion coming from aberrations is analysed and the effects on focal beam features are also discussed. Besides these influences, we also discuss the effects on contrast as well as the feature width of the atomic beam due to laser power and laser beam waist. The simulation results have shown that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width. Based on these analyse, we present some suggestions to minimize these influences.

关 键 词:NEUTRAL-ATOM LITHOGRAPHY STANDING-WAVE LIGHT DEPOSITION BEAM 

分 类 号:O44[理学—电磁学]

 

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