H_2O对SnO_2：F低辐射薄膜结构和性能的影响  

EFFECT OF H_2O ON STRUCTURE AND PROPERTIES OF SnO_2:F FILM

作　　者：赵洪力[1] 刘起英 蔡永秀[1] 张福成[1] 

机构地区：[1]亚稳材料制备技术与科学国家重点实验室 [2]杭州蓝星新材料技术有限公司,杭州310027

出　　处：《硅酸盐学报》2007年第11期1498-1502,共5页Journal of The Chinese Ceramic Society

基　　金：河北省自然科学基金(E2004000241)资助项目。

摘　　要：以单丁三氯化锡(C_4H_9SnCl_3)为前驱物,三氟乙酸(CF_3COOH)为掺杂元素F的引入剂,H_2O为催化剂,采用常压化学气相沉积法在浮法玻璃生产线上直接制备了F掺杂的SnO_2膜(SnO_2:F)。采用X射线衍射、扫描电子显微镜、椭圆偏光仪、紫外-可见光谱研究H_2O的用量对薄膜的结构和光电性能的影响。结果表明:水对薄膜结构和性能均有显著的影响,随着催化剂H_2O含量的增加,SnO_2:F为四方相金红石结构,薄膜结晶度提高,致密性得到改善,膜厚有所增加,方块电阻下降。在H_2O含量为1.8mol/L时效果较好。F-doped tin oxide film （SnO2：F） was prepared by atmosphere pressure chemical vapor deposition on float glass with monobutyltintrichloride （C4H9SnCl3） and trifluoroacetic acid （CF3COOH,） as the precursor and dopant respectively, and H2O was used as the catalyst. The effects of the content of H2O on the structure and properties of films were characterized by means of X-ray diffraction, scanning electron microscopy, ellipsometry and ultraviolet-visible-near infrared spectroscopy. Experimental results reveal that the structures and properties of the films are greatly affected by the H2O content. The SnO2：F film is tetragonal phase rutile, and the degree of crystallization of the film is better, the density of the film is more compact, the thickness of the film is increases and the square resistance （Ro） declines with the increase of H2O content. The better results can be obtained when the content of H2O reach 1.8 mol/L.

关 键 词：低辐射玻璃 在线镀膜 氧化锡 水 

分 类 号：TQ171.721[化学工程—玻璃工业]